| 摘要 |
An apparatus for charging dry air or nitrogen gas into a container for storing semiconductor wafers can remove chemical gas and moisture from the container, and then prevent acid from being generated at the surfaces of the wafers. The apparatus A for charging dry air or nitrogen gas into a container 1 for storing semiconductor wafers 9 is connected to an opening 8a, acting as an intake, and to an opening 8b, acting as an exhaust, wherein the container 1 comprises a plurality of openings 8 disposed at the bottom plate of the container 1, the apparatus comprising: PTFE filters 7 disposed at the plurality of openings 8a, 8b, a portion 11 for providing the dry air or nitrogen gas to the container 1, and a portion 12 for exhausting the used dry air or nitrogen gas from the container 1 after removing chemical gas and moisture from the container, and then preventing acid from being generated at the surfaces of the wafers 9.
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