| 摘要 |
In the present invention a mask (21) with a concentric pattern (a,b,c,d) is fabricated and aligned on a substrate (130) coated with a photoresist (131) and is then light-exposed. The light-exposed substrate is developed to obtain a concentric pattern of the photoresist in the form of tori. Then, a reflow process is performed for the developed substrate to allow the photoresist in the form of tori to be curved. A stamper in which the concentric pattern of the photoresist in thr form of tori is engraved in a depressed fashion is fabricated. Thereafter, by using the stamper as a mold, a lens and a lens array with the concentric pattern are formed.
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