| 摘要 |
<P>PROBLEM TO BE SOLVED: To rapidly measure the distribution of light emission intensity of plasma generated in a vacuum processing chamber with a simple structure. <P>SOLUTION: This plasma treatment device including the vacuum processing chamber 2, a sample base 7 for mounting and holding a sample in the vacuum processing chamber, and a plasma generation means 4 to generate plasma by supplying high-frequency energy to a process gas introduced in the vacuum processing chamber includes: an optical receiver 13 for receiving light emitted from the generated plasma in the outside of the vacuum processing chamber; a light reception adjuster 14 arranged between the optical receiver and the vacuum processing chamber for adjusting the range of plasma introduced into the optical receiver within the light emitted from the plasma; and a control device 16 for controlling the plasma treatment device based on a light reception amount obtained by changing the light reception range by the optical receiver by adjusting the light reception adjuster. <P>COPYRIGHT: (C)2010,JPO&INPIT |
