| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent the occurrence of cracks in a stationary film in a MEMS device. <P>SOLUTION: The MEMS device includes: a substrate 10 having a through-hole 15; a first film 11, whose bottom surface is exposed into the through-hole 15, disposed on the upper surface of the substrate 10; a second film 13 which is disposed adjacent the first film 11 with an air gap 16 interposed therebetween and has a hole group 14G made up of a plurality of holes 14 each connected to the air gap 16; and a support layer 17 having the air gap 16 formed therein and being disposed between the first film 11 and the second film 13. Several holes 14 located at the outermost side in the hole group 14G are arranged along the shape of the opening of an upper open end 15u in the through-hole 15 so that the distance between the adjacent holes 14 becomes uniform. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
