发明名称 INDIVIDUAL MIRROR FOR CONSTRUCTING A FACETED MIRROR, IN PARTICULAR FOR USE IN A PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY
摘要 An individual mirror (112) is used to construct a faceted mirror. A mirror element (79) of the individual mirror (112) can be tilted about at least one tilt axis (w1, w2) of a tilt joint (82, 83) relative to a rigid support element (81). The tilt joint (82, 83) is designed as a solid-body joint. The solid-body joint has a joint thickness S perpendicular to the tilt axis (w1, w2) and a joint length L along the tilt axis (w1, w2). The following applies: L/S > 50. The result is an individual mirror for constructing a faceted mirror that can be reproduced and precisely adjusted and at the same time ensures adequate heat removal, in particular produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror element.
申请公布号 WO2010079133(A2) 申请公布日期 2010.07.15
申请号 WO2010EP00044 申请日期 2010.01.08
申请人 CARL ZEISS SMT AG;WERBER, ARMIN;MUEHLBERGER, NORBERT;BACH, FLORIAN 发明人 WERBER, ARMIN;MUEHLBERGER, NORBERT;BACH, FLORIAN
分类号 G02B5/09;G02B26/08;G03F7/20 主分类号 G02B5/09
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