| 发明名称 |
METHOD OF PRODUCING THIN LAYERS OF A SILICON, AND THIN SILICON |
| 摘要 |
The invention relates to a method for producing thin layers (3) of a silicon that can be subjected to plastic treatment, whereby the silicon layer (3) is extruded, and to the thin silicon layer produced by said method.
|
| 申请公布号 |
US2010178824(A1) |
申请公布日期 |
2010.07.15 |
| 申请号 |
US20070305793 |
申请日期 |
2007.06.18 |
| 申请人 |
HUHTAMAKI FORCHHEIM ZWEIGNIEDERIASSUNG DER HUHTAMAKI DEUTSCHLAND GMBH & CO. KG |
发明人 |
STARK KURT;SCHMIDT WERNER;GUNTER WALTER |
| 分类号 |
B32B27/08;B29C47/06;B29C69/00;B32B27/10;C08G77/00 |
主分类号 |
B32B27/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
