发明名称 |
PLASMA GENERATING APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generating apparatus capable of obtaining plasmas of high density in the atmospheric pressure and making a plasma treatment process be in-line. <P>SOLUTION: The plasma generating apparatus includes: a cathode 10 on which non-penetrating micropores 12 opening over an entire face are formed; an anode 20 arranged in separation so as to be opposed to the face of the cathode 10; and a power supplying portion 30 for supplying power to the cathode 10 and the anode 20. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010157483(A) |
申请公布日期 |
2010.07.15 |
申请号 |
JP20090146570 |
申请日期 |
2009.06.19 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO LTD |
发明人 |
LEE EUNG-SUEK;YANAGI SAIKO;RYU CHANG SUP;HWANG JUN-OH;MOK JEE-SOO |
分类号 |
H05H1/24;H01L21/60 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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