发明名称 PLASMA GENERATING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma generating apparatus capable of obtaining plasmas of high density in the atmospheric pressure and making a plasma treatment process be in-line. <P>SOLUTION: The plasma generating apparatus includes: a cathode 10 on which non-penetrating micropores 12 opening over an entire face are formed; an anode 20 arranged in separation so as to be opposed to the face of the cathode 10; and a power supplying portion 30 for supplying power to the cathode 10 and the anode 20. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010157483(A) 申请公布日期 2010.07.15
申请号 JP20090146570 申请日期 2009.06.19
申请人 SAMSUNG ELECTRO-MECHANICS CO LTD 发明人 LEE EUNG-SUEK;YANAGI SAIKO;RYU CHANG SUP;HWANG JUN-OH;MOK JEE-SOO
分类号 H05H1/24;H01L21/60 主分类号 H05H1/24
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