发明名称 |
THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME |
摘要 |
<p>A thin film transistor which comprises an oxide semiconductor film containing indium oxide and at least one oxide selected from a group consisting of lanthanum oxide, neodymium oxide, samarium oxide, europium oxide, gadolinium oxide, terbium oxide, dysprosium oxide, holmium oxide, erbium oxide, thulium oxide and ytterbium oxide, wherein the atomic ratio M/(In + M) is 0.1 to 0.4 inclusive when the at least one oxide is represented by M2O3.</p> |
申请公布号 |
WO2010079581(A1) |
申请公布日期 |
2010.07.15 |
申请号 |
WO2009JP07330 |
申请日期 |
2009.12.28 |
申请人 |
IDEMITSU KOSAN CO.,LTD.;KASAMI, MASASHI;INOUE, KAZUYOSHI;YANO, KOKI;TOMAI, SHIGEKAZU;KAWASHIMA, HIROKAZU |
发明人 |
KASAMI, MASASHI;INOUE, KAZUYOSHI;YANO, KOKI;TOMAI, SHIGEKAZU;KAWASHIMA, HIROKAZU |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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