发明名称 THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
摘要 <p>A thin film transistor which comprises an oxide semiconductor film containing indium oxide and at least one oxide selected from a group consisting of lanthanum oxide, neodymium oxide, samarium oxide, europium oxide, gadolinium oxide, terbium oxide, dysprosium oxide, holmium oxide, erbium oxide, thulium oxide and ytterbium oxide, wherein the atomic ratio M/(In + M) is 0.1 to 0.4 inclusive when the at least one oxide is represented by M2O3.</p>
申请公布号 WO2010079581(A1) 申请公布日期 2010.07.15
申请号 WO2009JP07330 申请日期 2009.12.28
申请人 IDEMITSU KOSAN CO.,LTD.;KASAMI, MASASHI;INOUE, KAZUYOSHI;YANO, KOKI;TOMAI, SHIGEKAZU;KAWASHIMA, HIROKAZU 发明人 KASAMI, MASASHI;INOUE, KAZUYOSHI;YANO, KOKI;TOMAI, SHIGEKAZU;KAWASHIMA, HIROKAZU
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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