发明名称 Apparatus for Generating Gas Having Extremely Low Oxygen Concentration, Processing System and Thin Film Depositing Method Therewith, and Inert Gas Generated as Such
摘要 A gas, which has extremely low oxygen and water content without particles for industrial use and is effective in processes including an oxidation preventing step, can be supplied in a large quantity. An apparatus for generating such gas having extremely low oxygen/water content is provided with an oxygen molecule discharging apparatus (26) comprising a hollow ceramic solid electrolyte body (21), through which a gas passes, and metal tube bodies (20), all of which are adhered to each other in a leak-tight manner.
申请公布号 US2010178437(A1) 申请公布日期 2010.07.15
申请号 US20080531260 申请日期 2008.03.14
申请人 SHIRAKAWA NAOKI;YOSHIYUKI YOSHIDA;KAZUHIKO ENDO;TETSUYA MINO 发明人 SHIRAKAWA NAOKI;YOSHIYUKI YOSHIDA;KAZUHIKO ENDO;TETSUYA MINO
分类号 C23C16/44;C01B23/00;C25B9/00;G01N5/02;H05H1/24 主分类号 C23C16/44
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