发明名称 |
Apparatus for Generating Gas Having Extremely Low Oxygen Concentration, Processing System and Thin Film Depositing Method Therewith, and Inert Gas Generated as Such |
摘要 |
A gas, which has extremely low oxygen and water content without particles for industrial use and is effective in processes including an oxidation preventing step, can be supplied in a large quantity. An apparatus for generating such gas having extremely low oxygen/water content is provided with an oxygen molecule discharging apparatus (26) comprising a hollow ceramic solid electrolyte body (21), through which a gas passes, and metal tube bodies (20), all of which are adhered to each other in a leak-tight manner.
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申请公布号 |
US2010178437(A1) |
申请公布日期 |
2010.07.15 |
申请号 |
US20080531260 |
申请日期 |
2008.03.14 |
申请人 |
SHIRAKAWA NAOKI;YOSHIYUKI YOSHIDA;KAZUHIKO ENDO;TETSUYA MINO |
发明人 |
SHIRAKAWA NAOKI;YOSHIYUKI YOSHIDA;KAZUHIKO ENDO;TETSUYA MINO |
分类号 |
C23C16/44;C01B23/00;C25B9/00;G01N5/02;H05H1/24 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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