发明名称 HIGH PURITY FUSED SILICA WITH LOW ABSOLUTE REFRACTIVE INDEX
摘要 <p><P>PROBLEM TO BE SOLVED: To provide fused silica glass which has excellent birefringence and resistance to laser damage. <P>SOLUTION: The fused silica article has combined concentration of protium-containing hydroxy groups and deuteroxy groups less than about 10 ppm, and also has an absolute refractive index of less than or equal to 1.560835 at a wavelength of about 193.368 nm. A method of annealing fused silica glass is also provided. The method comprises the steps of: heating provided fused silica glass to a first temperature above the anneal point; cooling the fused silica glass to a second temperature below the strain point at a progressively decreasing cooling rate that is less than the anneal rate, wherein the progressively decreasing cooling rate is lower than the anneal rate of the fused silica glass; and cooling the fused silica glass from the second temperature to room temperature at a third cooling rate. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010155778(A) 申请公布日期 2010.07.15
申请号 JP20100000130 申请日期 2010.01.04
申请人 CORNING INC 发明人 DURAN CARLOS;FIACCO RICHARD MICHAEL;HRDINA KENNETH E;SEMPOLINSKI DANIEL RAYMOND
分类号 C03B20/00;C03C3/06;G02B1/02;G03F1/14;H01L21/027 主分类号 C03B20/00
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