发明名称 SEMICONDUCTOR MEMORY CELL AND METHOD OF MANUFACTURING THE SAME, AND METHOD OF OPERATING SEMICONDUCTOR MEMORY CELL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a semiconductor memory cell capable of scaling a single poly EEPROM cell to the level of a stack gate poly EEPROM cell. <P>SOLUTION: In the single poly EEPROM cell, a contact for coupling is formed on a floating gate FG, and the contact is connected in the direction of a word line polysilicon WL by a control gate CG line. A dielectric film 102 for coupling is formed between the contact and a polysilicon FG for floating gate, for performing coupling through the polysilicon FG for floating gate and the contact. The semiconductor memory cell enables program, erasure and reading. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010157733(A) 申请公布日期 2010.07.15
申请号 JP20090294485 申请日期 2009.12.25
申请人 DONGBU HITEK CO LTD 发明人 JUNG JIN-HYO
分类号 H01L21/8247;G11C16/04;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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