| 摘要 |
A wavefront-aberration-measuring device measures wavefront aberration of a to-be-tested optical system and includes a diffraction grating that splits light transmitted through the optical system, a detecting unit that detects interference fringes produced by beams of the split light, an arithmetic unit that calculates the wavefront aberration from the detected interference fringes, an image-side mask insertable into and retractable from an image plane of the optical system, and an illuminating unit that incoherently illuminates the image-side mask. The image-side mask has an aperture with a diameter larger than λ/2NA, where λ denotes a wavelength of the illuminating unit and NA denotes a numerical aperture of the to-be-tested optical system. The arithmetic unit calculates the wavefront aberration of the optical system from the interference fringes detected with the image-side mask being retracted from the image plane and the interference fringes detected with the image-side mask being in the image plane.
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