发明名称 POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing pad for notch polishing with which a notch part and its peripheral part can be finished into a mirror surface in notch polishing and which has a long product lifetime. <P>SOLUTION: The polishing pad has a three-layered structure wherein an inner layer part and an outer layer part of the polishing pad are different in density. The three-layered structure having the difference in density is formed having no border between the layers by impregnating a base with an urethane resin to make the outer layer part and inner layer part different in resin density. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010157619(A) 申请公布日期 2010.07.15
申请号 JP20080335184 申请日期 2008.12.26
申请人 NITTA HAAS INC 发明人 TODA TOMOYUKI;HABA SHINICHI;WAKITA TAKUSHI
分类号 H01L21/304;B24B37/22 主分类号 H01L21/304
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