发明名称 SUBSTRATE PROCESSING DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate processing device wherein the processing time is shortened and the accuracy of processing is improved, by a low-cost device constitution. <P>SOLUTION: There is provided with the substrate processing device which includes a processing head for applying a predetermined processing to optional places on the surface of the substrate, a first driving means for diving the substrate in a first direction and a second driving means for driving the processing head in a second direction orthogonal to the first direction and in which a two-dimensional processing is applied to the surface of the substrate with the processing head by combining a motion for driving the substrate into the first direction by a motion for driving the processing head in the second direction, wherein a third driving means for driving the processing head in the first direction is included, and the processing head is driven at a fixed speed in the first direction by the third driving means and the processing head is driven in the second direction by the second driving means while maintaining a state where the substrate is driven in the first direction at a fixed speed by the first driving means. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010155258(A) 申请公布日期 2010.07.15
申请号 JP20080334073 申请日期 2008.12.26
申请人 TORAY ENG CO LTD 发明人 TAO MASANORI;UCHIGATA TOMOO;HAMAKAWA NAOYOSHI;WADA HIROMITSU
分类号 B23K26/00;B23K26/08;H01L21/302;H01L31/04 主分类号 B23K26/00
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