PHOTOMASK AND METHOD FOR FABRICATING THE SAME

摘要

PURPOSE: A photomask and a method for fabricating the same are provided to improve a patterning performance by changing a mask structure. CONSTITUTION: A mask pattern is formed on a substrate(300). A first high-k material layer is arranged to protect the mask pattern while filling in the space between mask patterns. A light shield layer is formed on the first high-k material layer. The light shield layer and the first high-k material layer are patterned successively to form a first high-k material layer pattern(310a) and a light shield pattern(320a). The second high-k material layer(330) is formed on the outcome of light shield layer and the first high-k material layer.