METHOD FOR PREPARING METAL NANOPATTERNS USING ATOMIC FORCE MICROSCOPE LITHOGRAPHY

摘要

PURPOSE: A method for preparing metal nano-patterns using an atomic is provided to effectively form a metal nano pattern on a substrate corresponding to a probe of an atomic microscope by forming a resistor film after forming organic intermediate layer. CONSTITUTION: The surface of a substrate is reformed to a negative ion(S10). An organic compound intermediate layer is formed in the reformed substrate surface(S20). The resist including the organic-metallic compound is spread on the organic compound intermediate layer to form a resist film(S30). A voltage is applied between the probe of an atomic force microscope and the substrate to form a nano-pattern on the surface of the substrate(S40). The resist film is removed from the substrate in which the metal nano pattern is formed(S50).