Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability. In a method an ion beam is formed using a gas field ion source having a tip operating at voltage that is at least 5% greater than a best imaging voltage for the gas. Other methods of forming an ion beam using a mixture of gases are also disclosed. I
申请公布号
WO2010025211(A4)
申请公布日期
2010.07.15
申请号
WO2009US55127
申请日期
2009.08.27
申请人
CARL ZEISS SMT INC.;RAHMAN, FHM-FARIDUR;FARKAS, LOUIS, S., III;NOTTE, JOHN, A., IV
发明人
RAHMAN, FHM-FARIDUR;FARKAS, LOUIS, S., III;NOTTE, JOHN, A., IV