ETCHANT COMPOSITIONS FOR METAL LAMINATED FILMS HAVING TITANIUM AND ALUMINUM LAYER

摘要

PURPOSE: An etchant composition for titanium and aluminum metal lamination film is provided to summarily etch metal laminated layers without bad influence on a substrate. CONSTITUTION: A layer made of titanium(2) or titanium alloy and a layer made of aluminum or aluminum alloy are etched by etchant composition including fluoride and oxidizer. The fluoride is one or more among hexafluoride silicic acid and hydrofluoric acid, or hexafluoride silicic acid and metal, or the salt of ammonia. The concentration of fluoride is 0.01-5 mass%.