METHOD OF MANUFACTURING NANO STRUCTURE AND METHOD OF MANUFACTURING A PATTERN USING THE METHOD

摘要

PURPOSE: A method for manufacturing a nanostructure is provided to easily form the nanostructure which is successively arranged on a substrate using a block copolymer and to improve the productivity of the nanostructure and a polarizing plate. CONSTITUTION: A method for manufacturing a nanostructure comprises the following steps: forming a photoresist pattern on a substrate(110) including a neutral layer; forming a sacrificial structure including a first sacrificial block and a second sacrificial block using a first thin film including a first block copolymer; eliminating the first sacrificial block from the sacrificial structure; forming a chemical pattern(122) by oxidizing the neutral layer using the second sacrificial block as a mask; removing the second sacrificial block and the photoresist pattern from the substrate including the chemical pattern; and forming the nanostructure which is extensively arranged on the substrate using a second thin film including the second block copolymer.