| 摘要 |
<p>PURPOSE: A dummy pattern for the dishing protecting of the overlay mark embodies orthogonally in the unit pattern comprising the box pattern and dummy pattern. The damage of the overlay mark pattern is prevented among the chemical mechanical polishing. CONSTITUTION: A dummy pattern(304) prevents the dishing of the overlay mark in the chemical mechanical polishing. The dummy pattern includes the unit pattern(306) expanded as the linear type to the same direction a plurality of letter. The unit pattern the array shape reiterating with the fixed pitch and is arranged. It is arranged in the up down left right 4 side of the overlay mark. It is expanded as the direction perpendicular to the unit pattern is the box pattern(302) of the overlay mark.</p> |
