| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum vapor-deposition apparatus which can uniformize a temperature distribution with a simple structure and reduce an excessive filling of a material, and to provide a method for controlling temperature. Ž<P>SOLUTION: This vacuum vapor-deposition apparatus comprises: a vacuum chamber 1 that can accommodate a body B to be vapor-deposited therein, which is carried in from the outside; a crucible 12 which is arranged in the vacuum chamber 1 and accommodates a vapor-deposition material M therein; a heat source 3 which heats the crucible 12 and vaporizes the vapor-deposition material M. The heat source 3 varies the heat quantity to be applied to the crucible 12 according to a location of the crucible 12. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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