| 摘要 |
<p>A substrate treating system which can easily extend and modify a substrate treating module in accordance with the modification of treatment for a substrate. The substrate treating system is comprised of a main device (100) and auxiliary devices (200, 300). A transfer control portion (130) is comprised of a transfer procedure capturing portion (131), a destination judging portion (132), and a local transfer portion (133). The transfer procedure capturing portion (131) captures destination specifying information containing at least a local address and additional information by which a substrate treating device to which the local address belongs can be specified, and the destination of a substrate can be uniquely specified among the main device (100) and the auxiliary devices (200, 300). The destination judging portion (132) judges whether the destination of a substrate is the main device (100), the auxiliary device (200), or the auxiliary device (300) based on the destination specifying information captured from the transfer procedure capturing portion (131). The local transfer portion (133) transfers a substrate to a process chamber connected to a transfer chamber of each device using a local address uniquely allocated to each device.</p> |
