发明名称 METHOD FOR DEFECTING CONTACT NOT OPEN IN SEMECONDUCTOR DEVICE
摘要 PURPOSE: It examines the light in substrate and the contact not open detecting method of the semiconductor device induces N type junction area my photoelectric cell. In the contact plug inside, the lost electronics is recompensed with the secondary electron emission. CONSTITUTION: The second conductive type(40) junction area is formed in the substrate(31) in which the first conductive well(41) is formed. The contact plug(42) is formed on the junction area. The contact plug surface is charged to the positive charge. The light is examined in substrate and the photoelectric cell is created within the junction area. The primary electron is researched from the electron beam emission apparatus in the contact plug charged to the positive charge. The amount of the emitted secondary electron is detected from the contact plug by the primary electron.
申请公布号 KR20100079958(A) 申请公布日期 2010.07.08
申请号 KR20080138563 申请日期 2008.12.31
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, JONG PIL
分类号 H01L21/28 主分类号 H01L21/28
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