发明名称 BIPOLAR JUNCTION TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A bipolar transistor and a manufacturing method thereof are provided to constantly control a breakdown voltage by forming an extended base to constantly maintain a distance between an emitter and a collector. CONSTITUTION: A second conductive base area is formed on the upper area of a first conductive semiconductor substrate(210). Grooves with a step structure are formed in a base area. A poly silicon(240) doped with a first conductive impurity is buried in the grooves with the step structure. An emitter area(230) with the step structure is formed between the poly silicon and the base area. The lower side of the base area is extended to the lower side of the semiconductor substrate.
申请公布号 KR20100079575(A) 申请公布日期 2010.07.08
申请号 KR20080138103 申请日期 2008.12.31
申请人 DONGBU HITEK CO., LTD. 发明人 LIM, HYON CHOL
分类号 H01L29/73;H01L21/8248 主分类号 H01L29/73
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