发明名称 IMAGE SENSOR AND FABRICATING METHOD FOR THE SAME
摘要 PURPOSE: An image sensor and a manufacturing method thereof are provided to reduce manufacturing costs by providing a CMOS image sensor with a middle size format above an available field size by using an existing photo apparatus. CONSTITUTION: First to fourth image sensing units(110,120,130,140) are arranged left, right, up and down. First to fourth pixel arrays are formed on the first to fourth image sensing units and are adjacent. First to fourth peripheral circuits are formed on the outer side of the first to fourth image sensing units. The second to fourth image sensing units are comprised of the reverse pattern of the first image sensing unit. The first to fourth image sensing units are formed on four dies which are adjacent on the wafer.
申请公布号 KR20100078103(A) 申请公布日期 2010.07.08
申请号 KR20080136260 申请日期 2008.12.30
申请人 DONGBU HITEK CO., LTD. 发明人 LEE, CHANG EUN
分类号 H01L27/146 主分类号 H01L27/146
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