| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which supplies and recovers a liquid in a desired state, thereby suppressing deterioration of a pattern image projected on a substrate. <P>SOLUTION: The exposure apparatus includes a nozzle member (70) having a supply opening (12) for supplying a liquid (LQ) and a recovery opening (22) for recovering the liquid (LQ), and an antivibration mechanism (60) for supporting the nozzle member (70) against a lower step portion (7) of a main column (1) in a vibration isolating manner. <P>COPYRIGHT: (C)2010,JPO&INPIT |
