| 摘要 |
PURPOSE: A wet station apparatus is provided to prevent the collision between wafer holders by sensing whether a wafer is accepted into the wafer holder. CONSTITUTION: A loading unit(100) loads a wafer holder accepting a plurality of wafers. A chemical bath accepts the chemical for processing wafers. A buffer(400) temporarily accepts the wafer holder. An unloader(500) unloads the wafer holder accepted to the buffer. The unloader comprises an optical sensor sensing whether the wafer holder is accepted in the buffer. A transfer unit moves the wafer holder to the chemical bath or the buffer.
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