发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: An image sensor and a method for manufacturing the same are provided to improve a photo-sensitivity by reducing a distance between a photo-diode and a micro-lens. CONSTITUTION: A first substrate includes an electrical junction region, a transistor, and a wiring. The wiring connects the electrical junction region and the transistor. A second substrate is formed on the first substrate, a photo-diode(210) is formed on the second substrate. The second substrate includes a via-hole and a contact metal(281). The via-hole passes through the second substrate. The contact metal is formed in the via-hole and is connected with the wiring.
申请公布号 KR20100078361(A) 申请公布日期 2010.07.08
申请号 KR20080136605 申请日期 2008.12.30
申请人 DONGBU HITEK CO., LTD. 发明人 KIM, SEOUNG HYUN
分类号 H01L27/146;H01L21/28 主分类号 H01L27/146
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