| 摘要 |
PURPOSE: A chemical vapor deposition device and a method thereof are provided to prevent an unnecessary RF power-off and an open chamber by modifying an error after observing the inside of the chamber through a camera when an error is generated inside the chamber. CONSTITUTION: A view port(110) is formed in the sidewall of a chamber(100). A camera(120) photographs the inside of the chamber through the view port in the outside of the chamber. A monitor displays an image through the camera. An error detection system(130) is connected to the camera and the chamber. The error detection system analyzes the errors inside the chamber and controls the chamber.
|
