| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering apparatus and a film deposition method capable of executing the film deposition of high quality in a groove having an inclined wall such as a V-groove. Ž<P>SOLUTION: The sputtering apparatus comprises a rotatable cathode 102, a rotatable stage 101 and a rotatable shading plate 105. The shading plate 105 has a slit-like aperture 108, and sputtered particles can be passed therethrough via the aperture 108. In the aperture 108, the width in the direction orthogonal to the rotational direction is larger than the width in the rotational direction of the shading plate 105. Further, at least one V-groove is formed in a substrate 104 arranged on a substrate supporting surface, and the longitudinal direction of the V-groove coincides with the direction orthogonal to the rotational direction of the shading plate 105. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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