(METH)ACRYLATE COMPOUND, AND PHOTOSENSITIVE POLYMER, AND RESIST COMPOSITION

摘要

PURPOSE: A (meth)acrylate compound, photosensitive polymer, and resist composition are provided to improve line edge roughness on pattern profile. CONSTITUTION: A (meth)acrylate compound containing lactone group is denoted by chemical formula 1. The (meth)acrylate compound is a compound of chemical formula 1a. A photosensitive polymer contains a repeat unit induced by compounds of chemical formula 1, 2, and 3. The photosensitive polymer has molecular weight of 3,000-20,000 and dispersion degree(Mw/Mn) of 1.5-2.5. A resist composition contains the photosensitive polymer, photoacid generator, and solvent.