ELECTROSTATIC CHUCK AND MEASURING METHOD FOR BIAS VOLTAGE OF THE SUBSTRATE

摘要

PURPOSE: A bias voltage measuring method of the substrate using the electrostatic chuck and electrostatic chuck is provided the displacement current generating between substrate and probe part from the probe part. The real bias voltage of substrate is produced. CONSTITUTION: A base part(220) supports the substrate(S). A dielectric layer(210) is formed on the top of the base part. The probe part(280) is formed through the base part and dielectric layer. The voltage output unit produces the bias voltage generating in substrate. The contact unit(240) touches with substrate. The lifting unit(270) raises the contact unit.