SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method thereof are provided to improve the sensing efficiency of a substrate by changing or extending the optical path of an optical sensor which detects whether a substrate entered or whether the damage occurred. CONSTITUTION: A substrate(S) is accepted inside a chamber(100). An optical sensor(210) receives the lights on one side in which the substrate progresses. A first reflecting body(220) reflects the light in a position different from the optical sensor. A second reflecting body(230) reflects the light transmitting the substrate to the first reflecting body. The second reflecting body comprises a first reflecting mirror and a second reflecting mirror.