| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of carrying out accurate exposure processing allowing liquid to be appropriately held between a projection optical system and a substrate. <P>SOLUTION: In the exposure apparatus, a liquid immersion region for liquid LQ is formed between a projection optical system PL and a substrate P and the substrate P is exposed via the projection optical system PL and the liquid LQ in the liquid immersion region. The exposure apparatus includes: a nozzle member 70 having at least one of a supply port 12 for supplying the liquid LQ and a collection port 22 for collecting the liquid LQ; and a nozzle adjustment mechanism 80 for adjusting at least one of the position and the posture of the nozzle member 70 according to the position or the posture of the substrate P. <P>COPYRIGHT: (C)2010,JPO&INPIT |
