发明名称 |
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT ELECTRODE |
摘要 |
A sputtering target which is composed of a sintered body of an oxide which contains at least indium, tin, and zinc and includes a spinel structure compound of Zn2SnO4 and a bixbyite structure compound of In2O3. A sputtering target includes indium, tin, zinc, and oxygen with only a peak ascribed to a bixbyite structure compound being substantially observed by X-ray diffraction (XRD).
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申请公布号 |
US2010170696(A1) |
申请公布日期 |
2010.07.08 |
申请号 |
US20060065405 |
申请日期 |
2006.08.30 |
申请人 |
YANO KOKI;INOUE KAZUYOSHI;TANAKA NOBUO;TANAKA TOKIE;KAIJO AKIRA;UMENO SATOSHI |
发明人 |
YANO KOKI;INOUE KAZUYOSHI;TANAKA NOBUO;TANAKA TOKIE;KAIJO AKIRA;UMENO SATOSHI |
分类号 |
H01B5/00;B22F3/12;C23C14/34;H01B1/02;H01B13/00 |
主分类号 |
H01B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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