GAS DISTRIBUTION UNIT AND ATOMIC LAYER DEPOSITION APPARATUS HAVING THE SAME

摘要

PURPOSE: A gas injection part and an atomic layer deposition device thereof are provided to prevent the defect of the thickness and the film quality of a thin film due to the rotation of a substrate or a susceptor by executing a deposition process with a fixed substrate. CONSTITUTION: A source gas spraying part(131) is located in the upper part of a horizontally supported substrate(10). The source gas spraying part sprays source gas(S1,S2) including a source material. A purge gas spraying part(133) sprays purge gas for the purge of the source gas to the substrate. The source gas spraying part comprises a first injection body and a second injection body. The second injection body selectively opens and closes the first flow path with the elevating movement.