发明名称 VARIABLE RESISTIVE ELEMENT, MANUFACTURING METHOD FOR SAME, AND NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 Provided is a variable resistive element which performs high speed and low power consumption operation. The variable resistive element comprises a metal oxide layer between first and second electrodes wherein electrical resistance between the first and second electrodes reversibly changes in accordance with application of electrical stress across the first and second electrodes. The metal oxide layer has a filament, which is a current path where the density of a current flowing between the first and second electrodes locally increases. A portion including at least the vicinity of an interface between the certain electrode, which is one or both of the first and second electrodes, and the filament, on an interface between the certain electrode and the metal oxide layer is provided with an interface oxide which is an oxide of at least one element included in the certain electrode and different from the oxide of the metal oxide layer.
申请公布号 US2010172170(A1) 申请公布日期 2010.07.08
申请号 US20080598642 申请日期 2008.04.07
申请人 TAMAI YUKIO;HOSOI YASUNARI;AWAYA NOBUYOSHI;OHNISHI SHIGEO;ISHIHARA KAZUYA;SHIMA HISASHI;AKINAGA HIROYUKI;TAKANO FUMIYOSHI 发明人 TAMAI YUKIO;HOSOI YASUNARI;AWAYA NOBUYOSHI;OHNISHI SHIGEO;ISHIHARA KAZUYA;SHIMA HISASHI;AKINAGA HIROYUKI;TAKANO FUMIYOSHI
分类号 G11C11/56;H01L21/44;H01L29/22 主分类号 G11C11/56
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