A susceptor for supporting a semiconductor wafer during a chemical vapor deposition process includes a body having opposing upper and lower surfaces. Support bosses extend downward from the lower face of the body. Each support boss has a boss opening sized and shaped for receiving a support post of a chemical vapor deposition device to mount the susceptor on the support post.
申请公布号
WO2009086257(A8)
申请公布日期
2010.07.08
申请号
WO2008US87927
申请日期
2008.12.22
申请人
MEMC ELECTRONIC MATERIALS, INC.;PITNEY, JOHN, A.;HAMANO, MANABU;HELLWIG, LANCE, G.
发明人
PITNEY, JOHN, A.;HAMANO, MANABU;HELLWIG, LANCE, G.