| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for obtaining a resin pattern which has good strippability while having satisfactory chemical resistance, and which exhibits good adhesiveness to a metal film on a base material, and to provide a method for manufacturing an etched substrate using such a resin pattern. <P>SOLUTION: The photosensitive resin composition includes an alkali-soluble resin (A) prepared by reacting an acid radical-containing acrylic resin with an alicyclic epoxy group-containing unsaturated compound, a polyfunctional monomer (B) having tri- or higher functionality, a nitrogen-containing monofunctional monomer (C), and a photoinitiator (D). <P>COPYRIGHT: (C)2010,JPO&INPIT |
