发明名称 MAGNET UNIT, AND MAGNETRON SPUTTERING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a magnet unit which can homogenize the thickness distribution of a thin film to be formed on a substrate, without increasing the length and width of a target. <P>SOLUTION: The magnet unit 50 comprises an annular outer magnet 30 arranged over a yoke 20 on the back side of a cathode electrode and along the contour of a target 6, and an inner magnet 40 arranged in the annular outer magnet and made different in polarity from the outer magnet, whereby the tangents of magnetic lines of force M generated over the target form the magnetic tracks MT of a set of areas parallel to the target face. The magnet unit also comprises extending magnetic poles 41 of an n-number (n indicates a positive integer of 2 or more) extending from the central portion of the inner magnet and approaching the two longitudinal ends of the outer magnet, and protruding magnetic poles 32 of a (n-1)-number protruding longitudinally inward from the inner sides of the two ends of the outer magnet and positioned between the extending magnetic poles of the n-number. The extending magnetic poles of the n-number and the protruding magnetic poles of the (n-1)-number form folded-back sections U of a (2n-1)-number at the two longitudinal ends of the magnetic track. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010150668(A) 申请公布日期 2010.07.08
申请号 JP20100041259 申请日期 2010.02.26
申请人 CANON ANELVA CORP 发明人 ENDO TETSUYA;ABARRA EINSTEIN NOEL
分类号 C23C14/35;H05H1/46 主分类号 C23C14/35
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