发明名称 |
METHOD FOR ANALYSIS OF COMPOSITION OF PHOTOSENSITIVE RESIN COPOLYMER USING FOURIER TRANSFORM NEAR-INFRARED SPECTROSCOPY |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for analysis of composition of a photosensitive resin copolymer using Fourier Transform Near-Infrared Spectroscopy (FT-NIR). <P>SOLUTION: In the analysis method, a calibration curve to each monomer is formed from a mixture acquired by mixing two or more kinds of monomers at various ratios by analysis using the Fourier Transform Near-Infrared Spectroscopy (FT-NIR), and then a value acquired by FT-NIR analysis of the photosensitive resin copolymer to be analyzed including two or more kinds of monomers is substituted for the calibration curve, to thereby calculate a copolymer composition. According to the analysis method, a monomer composition in the photosensitive resin copolymer for photoresist acquired by mixing various monomers can be analyzed more conveniently with reproducibility. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010151779(A) |
申请公布日期 |
2010.07.08 |
申请号 |
JP20090028846 |
申请日期 |
2009.02.10 |
申请人 |
SONGWON INDUSTRIAL CO LTD |
发明人 |
PARK DONG KYUNG;KIM JONTEKU;PARK CHAN-WON;CHOI YOUNG-GEUN;KIM SANG HA |
分类号 |
G01N21/27;G01N21/35;G01N21/3577;G01N21/359 |
主分类号 |
G01N21/27 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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