| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can perform a plurality of kinds of processing efficiently on a substrate in the predetermined order even if the number of processing units which actually process the substrate changes. SOLUTION: A plurality of kinds of processing are performed on a substrate W by conveying the substrate W in the order of a coating unit RESIST for resist film, a heating and cooling unit PHP, and a cooling unit CP. Even if one heating and cooling unit PHP is removed when three coating units RESIST for resist film, two heating and cooling units PHP and one cooling unit CP are being used as processing units, for example, the substrate W can be processed in the predetermined order by the remaining processing units under use. COPYRIGHT: (C)2010,JPO&INPIT |
