| 摘要 |
<p>PURPOSE: An OPC method using SEM calibration modeling is provided so that it extracts only the model date of the necessary domain and OPC method using SEM calibration modeling reflects. The more correct prediction model is made. And the time to be required to the simulation carrying out is reduced. CONSTITUTION: An OPC method uses the SEM calibration modeling reflecting the model date drawn from the SEM(Scanning Electronic Microscope) image of the photosensitive pattern. The model date(400) is drawn among the SEM image of the same pattern from the partial domain. The partial domain the area in which the profile of the side is formed as the edge area of the photosensitive pattern about substrate with the angle smaller than figure 90.</p> |
