| 摘要 |
PURPOSE: A device and a method for washing a semiconductor device using high-pressure steam are provided to improve productivity by reducing washing time and the number of processes of a solder ball flux tool. CONSTITUTION: A device(10) for washing a semiconductor device using high-pressure steam comprises a washing unit(100), a semiconductor device fixing unit(200), a washing unit moving unit(400), and a semiconductor device support unit(300). The washing unit washes a semiconductor device(800) using high pressure steam and eliminates moisture inside the semiconductor device. The semiconductor device fixing unit fixes the semiconductor device and supplies purge air. The washing unit moving unit moves and supports the washing unit. The semiconductor device support unit supports the semiconductor device.
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