| 摘要 |
PURPOSE: A slurry composition for chemical mechanical polishing is provided to use silica of which surface is coated with metal or metal oxide and to obtain high polishing rate. CONSTITUTION: A slurry composition for chemical mechanical polishing contains 0.01-10 weight% of polishing agent which is a silica of which surface is coated with metal ion or metal oxide, and 0.1-10 weight% of oxidizer. The metal ion coated on the silica surface is one or more kinds selected from a group consisting of cerium, aluminum, zirconium, and titanium. The metal oxide is selected from a group consisting of ceria, alumina, zirconia, and titania.
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