ATOMIC LAYER DEPOSITION APPARATUS

摘要

PURPOSE: An atomic layer deposition device is provided to improve the thickness and the quality of a thin film which is deposited on a substrate by uniformly maintaining the injection amount of deposition gas and the discharge amount of discharging gas. CONSTITUTION: A plurality of substrates are stored in a process chamber performing a deposition process. A susceptor is located inside the process chamber. The susceptor settles a plurality of substrates in a horizontal direction. A shower head(103) is located in the upper part of the susceptor. The shower head comprises a plurality of injection holes(131) spraying deposition gas. A spray pattern varying part(105) selectively opens and closes the injection hole.