发明名称 TRENCH MOSFET WITH IMPROVED SOURCE-BODY CONTACT
摘要 A trench MOSFET with improved source-body contact structure is disclosed. The improved contact structure can enlarge the P+ area below to wrap the sidewalls and bottom of source-body contact within P-body region to further enhance the avalanche capability. On the other hand, one of the embodiments disclosed a wider tungsten plug structure to connect source metal, which helps to further reduce the source contact resistance.
申请公布号 US2010171173(A1) 申请公布日期 2010.07.08
申请号 US20090350904 申请日期 2009.01.08
申请人 FORCE MOS TECHNOLOGY CO. LTD. 发明人 HSIEH FU-YUAN
分类号 H01L29/78;H01L21/04;H01L21/336;H01L21/8238;H01L29/06;H01L29/768 主分类号 H01L29/78
代理机构 代理人
主权项
地址