发明名称 |
TRENCH MOSFET WITH IMPROVED SOURCE-BODY CONTACT |
摘要 |
A trench MOSFET with improved source-body contact structure is disclosed. The improved contact structure can enlarge the P+ area below to wrap the sidewalls and bottom of source-body contact within P-body region to further enhance the avalanche capability. On the other hand, one of the embodiments disclosed a wider tungsten plug structure to connect source metal, which helps to further reduce the source contact resistance.
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申请公布号 |
US2010171173(A1) |
申请公布日期 |
2010.07.08 |
申请号 |
US20090350904 |
申请日期 |
2009.01.08 |
申请人 |
FORCE MOS TECHNOLOGY CO. LTD. |
发明人 |
HSIEH FU-YUAN |
分类号 |
H01L29/78;H01L21/04;H01L21/336;H01L21/8238;H01L29/06;H01L29/768 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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