发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER, AND COLOR FILTER PREPARED BY USING SAME
摘要 PURPOSE: A photoresist resin composition for a color filter and the color filter manufactured therefrom are provided to improve the color property and the development property of the color filter. CONSTITUTION: A photoresist resin composition for a color filter contains the following: an alkali soluble resin; a photopolymerization monomer including a compound marked with chemical formula 1; a photopolymerization initiator; a pigment; and a solvent. In the chemical formula 1, A is selected from the group including -CO-, -O-, -SO2-, and others. R3 and R4 are selected from the group consisting of a hydrogen atom, a halogen atom, and a substituted or non-substituted alkyl group with the carbon number of 1~5. R5 and R6 are the hydrogen atom or a methyl group.
申请公布号 KR20100078845(A) 申请公布日期 2010.07.08
申请号 KR20080137217 申请日期 2008.12.30
申请人 CHEIL INDUSTRIES INC. 发明人 AHN, HYUN JUNG;HAN, GYU SEOK;CHO, SANG WON;BYON, NOH SEOK;JUNG, JU HO;HONG, JIN KI
分类号 G03F7/027;G02B5/20;G03F7/028 主分类号 G03F7/027
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