发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER, AND COLOR FILTER PREPARED BY USING SAME |
摘要 |
PURPOSE: A photoresist resin composition for a color filter and the color filter manufactured therefrom are provided to improve the color property and the development property of the color filter. CONSTITUTION: A photoresist resin composition for a color filter contains the following: an alkali soluble resin; a photopolymerization monomer including a compound marked with chemical formula 1; a photopolymerization initiator; a pigment; and a solvent. In the chemical formula 1, A is selected from the group including -CO-, -O-, -SO2-, and others. R3 and R4 are selected from the group consisting of a hydrogen atom, a halogen atom, and a substituted or non-substituted alkyl group with the carbon number of 1~5. R5 and R6 are the hydrogen atom or a methyl group. |
申请公布号 |
KR20100078845(A) |
申请公布日期 |
2010.07.08 |
申请号 |
KR20080137217 |
申请日期 |
2008.12.30 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
AHN, HYUN JUNG;HAN, GYU SEOK;CHO, SANG WON;BYON, NOH SEOK;JUNG, JU HO;HONG, JIN KI |
分类号 |
G03F7/027;G02B5/20;G03F7/028 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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