FLUORINE CONTAINING COMPOUND, FLUORINE CONTAINING POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

摘要

PROBLEM TO BE SOLVED: To introduce a new repeating unit having an acid group, capable of forming a pattern with good rectangle characteristics, into a base resin of a resist composition that forms a pattern using a high energy ray or electronic ray of a wavelength of at most 300 nm.

SOLUTION: The fluorine containing polymer compound includes a repeating unit (a) represented by formula (2) and has a weight average molecular weight of 1,000-1,000,000. (In the formula, R1represents a polymerizable group having a double bond; R2represents a fluorine atom or an alkyl group containing fluorine; R3represents a hydrogen atom, an acid labile group, a cross-linking group or another monovalent organic group; and W1is a linking group).

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