| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition equipment capable of suppressing a high-temperature-atmosphere and corrosive gas in a chamber so that it flows not from all directions, but from only one direction even if it flows out without giving thermal damage due to radiation of heat to devices in all the directions outside the chamber. SOLUTION: The vapor deposition equipment has a guard 7 covering an opening 12a, formed along a contact part peripheral edge of a chamber body 17 and a chamber cover 19, from outside. The guard 7 has a shorter vertical length at a part of a conveyance path for conveying a substrate 21 than at other parts. COPYRIGHT: (C)2010,JPO&INPIT
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